Kev Txheeb Xyuas Txog Photoresist
Photoresist, tseem hu ua photoresist, yog hais txog cov khoom siv zaj duab xis nyias uas nws cov solubility hloov pauv thaum raug rau lub teeb UV, electron beams, ion beams, X-rays, lossis lwm yam hluav taws xob.
Nws muaj cov resin, photoinitiator, cov kuab tshuaj, monomer, thiab lwm yam khoom ntxiv (saib Rooj 1). Photoresist resin thiab photoinitiator yog cov khoom tseem ceeb tshaj plaws uas cuam tshuam rau kev ua haujlwm ntawm photoresist. Nws yog siv los ua txheej tiv thaiv xeb thaum lub sijhawm photolithography.
Thaum ua cov nplaim semiconductor, siv cov photoresist xaiv tau zoo tuaj yeem tsim cov duab xav tau ntawm qhov chaw.
Rooj 1.
| Cov Khoom Xyaw Photoresist | Kev ua tau zoo |
| Cov kuab tshuaj | Nws ua rau photoresist kua thiab volatile, thiab yuav luag tsis muaj kev cuam tshuam rau cov khoom tshuaj ntawm photoresist. |
| Photoinitiator | Nws tseem hu ua photosensitizer lossis photocuring agent, yog cov khoom siv photosensitive hauv cov khoom siv photoresist. Nws yog ib hom tshuaj uas tuaj yeem lwj mus rau hauv cov dawb radicals lossis cations thiab pib cov tshuaj sib txuas hauv cov monomers tom qab nqus ultraviolet lossis lub zog pom ntawm qee qhov wavelength. |
| Cov roj hmab | Nws yog cov polymers inert, thiab ua haujlwm ua cov binders los tuav cov ntaub ntawv sib txawv hauv photoresist ua ke, muab cov photoresist nws cov khoom siv kho tshuab thiab tshuaj lom neeg. |
| Monomer | Nws tseem hu ua cov tshuaj diluents nquag, yog cov molecules me me uas muaj cov pab pawg ua haujlwm polymerizable thiab yog cov tshuaj sib xyaw ua ke uas tsis muaj molecular hnyav uas tuaj yeem koom nrog cov tshuaj tiv thaiv polymerization los tsim cov resins hnyav molecular siab. |
| Cov khoom ntxiv | Nws yog siv los tswj cov khoom siv tshuaj lom neeg tshwj xeeb ntawm photoresists. |
Cov photoresists raug muab faib ua ob pawg tseem ceeb raws li daim duab uas lawv tsim: zoo thiab tsis zoo. Thaum lub sijhawm photoresist, tom qab raug thiab txhim kho, cov khoom uas raug tso tawm ntawm cov txheej txheej yuav yaj, tawm hauv cov khoom uas tsis raug tso tawm. Cov txheej txheej no suav hais tias yog cov photoresist zoo. Yog tias cov khoom uas raug tso tawm tseem nyob thaum cov khoom uas tsis raug tso tawm yaj, cov txheej txheej no suav hais tias yog cov photoresist tsis zoo. Nyob ntawm qhov chaw teeb pom kev thiab qhov chaw hluav taws xob, cov photoresists raug cais ntxiv ua UV (suav nrog cov photoresists UV zoo thiab tsis zoo), cov photoresists UV tob (DUV), cov photoresists X-ray, cov photoresists electron beam, thiab cov photoresists ion beam.
Photoresist feem ntau yog siv rau hauv kev ua cov qauv zoo hauv cov vaj huam sib luag zaub, cov circuits sib xyaw, thiab cov khoom siv semiconductor discrete. Cov thev naus laus zis tsim khoom tom qab photoresist yog qhov nyuaj, nrog ntau hom khoom thiab cov lus qhia. Kev tsim khoom siv hluav taws xob hauv kev lag luam hluav taws xob tsim cov kev cai nruj rau cov photoresist siv.
Ever Ray, ib lub chaw tsim khoom uas muaj 20 xyoo ntawm kev paub tshwj xeeb hauv kev tsim khoom thiab kev txhim kho cov photocurable resins, muaj peev xwm tsim khoom txhua xyoo ntawm 20,000 tons, cov kab khoom tiav, thiab lub peev xwm los kho cov khoom. Hauv photoresist, Ever Ray muaj 17501 resin ua lub ntsiab tivthaiv.
