Pawg Xov Xwm

Nyob rau hauv ib puag ncig kev lag luam uas muaj kev sib tw ntau zuj zus, kev tsim kho tshiab ntawm thev naus laus zis tau dhau los ua ib qho tseem ceeb rau kev ciaj sia thiab kev loj hlob ntawm cov tuam txhab. Yuav kom tswj tau txoj haujlwm ua tus thawj coj hauv kev lag luam uas hloov pauv tas li, cov tuam txhab yuav tsum muaj lub zeem muag zoo, kev koom ua ke ntawm kev nqis peev thev naus laus zis nrog kev thov ntawm kev ua lag luam, yog li tsim ib lub voj voog ntawm "kev nkag siab txog kev thov - thev naus laus zis R & D - kev hloov pauv lag luam." Raws li CEO ntawm ib lub tuam txhab thev naus laus zis loj tau hais tias, "Peb tsis ntshai kev sib tw; peb ntshai siv thev naus laus zis nag hmo los daws cov teeb meem tag kis."

Stereolithography (SLA lossis SL) yog ib qho thev naus laus zis luam ntawv 3D uas muaj kev ua haujlwm siab siv cov resin photosensitive ua cov khoom siv raw. Cov thev naus laus zis no siv cov khoom kho sai ntawm cov resin photosensitive nyob rau hauv qhov ntev tshwj xeeb UV laser irradiation, ua rau muaj kev ua tau zoo ntawm cov qauv 3D nyuaj los ntawm kev tsim cov txheej txheem.

Photoresist, tseem hu ua photoresist, yog hais txog cov khoom siv zaj duab xis nyias uas nws cov solubility hloov pauv thaum raug rau lub teeb UV, electron beams, ion beams, X-rays, lossis lwm yam hluav taws xob.

Hauv kev lag luam ntawm lub teeb pom kev zoo thiab cov hlua teeb pom kev zoo nkauj, kev hloov pauv thev naus laus zis coj los ntawm cov resins kho lub teeb tau txhais dua lub pob khoom LED chips. Cov khoom siv tshiab no tsis yog tsuas yog ua kom muaj txiaj ntsig zoo dua xwb, tab sis kuj qhia txog cov txiaj ntsig zoo hauv kev txuag hluav taws xob thiab kev tiv thaiv ib puag ncig.

Xav txog ib yam kua uas hloov ua iav ntshiab thiab khov kho hauv vib nas this hauv qab lub teeb UV. Qhov ntawd yog lub khawv koob ntawm cov roj hmab uas kho tau lub teeb, thiab nws ua rau lub ntiaj teb ntawm kev siv cov kua nplaum siv lead ua thoob plaws hauv kev nyiam ua si thiab kev lag luam.

Taug kev mus rau hauv txhua lub chaw ua dej cawv zoo tshaj plaws lub tsev ntim khoom, thiab koj yuav pom kev sib xyaw ua ke. Thaum lub tshuab nias dov, cov kua siv lead ua kua ntshiab kiss cov qauv kub-foiled. Tom qab ntawd - qhov qhia tawm. Hauv qab lub teeb UV, cov kua ntawd tawg paj. Tsis yog ua kom muaj zog, tab sis zoo li te crystallizing ntawm lub qhov rais Lub Ib Hlis. Hauv vib nas this, ib daim ntaub ntawm cov dej khov tawg thoob plaws qhov chaw. Khiav koj tus ntiv tes xoo rau ntawm nws: lub caij ntuj no txias illusion ntsib kev lag luam-qib kev tawv. Qhov no yog "snowflake ink" - qhov twg photochemistry ntsib kev nplua nuj. Thiab tam sim no, ua tsaug rau cov UV resins tiam tom ntej, nws tsis yog tsuas yog zoo nkauj xwb; nws tau tsim los kav ntev.

Thaum pib ntawm Ever Ray tau tsim tawm xyoo 2006, nws tsis yog tsuas yog tsom mus rau kev tshawb fawb thiab kev txhim kho xwb, tab sis kuj tseem tsim cov resins UV-curable. Nws ua haujlwm ob lub hauv paus tsim khoom ntse hauv Yunfu thiab Jiangmen, nrog rau lub peev xwm tsim khoom txhua xyoo ntau dua 20,000 tons. Nws cov kab khoom suav nrog: polyurethane acrylate (PUA), epoxy acrylate (EA), silicone-modified resins, thiab lwm yam ...

Hauv kev tsim ntoo niaj hnub uas nrhiav kev ua haujlwm zoo, kev zoo nkauj thiab kev tiv thaiv ib puag ncig, kev xaiv cov txheej txheem txheej txheem ncaj qha txiav txim siab qhov zoo ntawm cov khoom thiab tus nqi tsim khoom. Kev txheej txheem dov, kev txheej txheem tsuag, thiab kev txheej txheem da dej yog peb txoj hauv kev tseem ceeb, nrog lawv tus kheej cov yam ntxwv sib txawv, thiab ua lub luag haujlwm tseem ceeb hauv ntau qhov xwm txheej siv. Kev nkag siab tob txog lawv cov txiaj ntsig thiab qhov tsis zoo yog ib kauj ruam tseem ceeb rau cov tuam txhab tsim ntoo kom ua kom zoo dua qub thiab txhim kho kev sib tw.

Hauv kev lag luam ntawm cov khoom siv nqus tsev electroplating primer, Ever Ray tau tawm tswv yim txog cov mis tshuaj tshiab: difunctional polyurethane acrylate 13%; difunctional polycarbonate acrylic resin 12%; tetrafunctional polyester acrylate 13%; trifunctional monomer TMPTA 12%; polyether hloov kho polydimethylsiloxane 0.1%; photosensitizer 3.5%; solvent 46.4%2.